Scalable Disordered Hyperuniform Architectures <i>via</i> Nanoimprint Lithography of Metal Oxides
نویسندگان
چکیده
Fabrication and scaling of disordered hyperuniform materials remain hampered by the difficulties in controlling spontaneous phenomena leading to this novel kind exotic arrangement objects. Here, we demonstrate a hybrid top-down/bottom-up approach based on sol–gel dip-coating nanoimprint lithography for faithful reproduction metasurfaces metal oxides. Nano- microstructures made silica titania can be directly printed over several cm2 glass silicon substrates. First, describe polymer mold fabrication starting from hard master obtained via solid-state dewetting SiGe Ge thin layers SiO2. Then, assess effective character replica role thickness layer oxide replicas presence residual underneath. Finally, as potential application, show antireflective structures silicon. Our results are relevant realistic implementation large scales nano- microarchitectures oxides, thus opening their exploitation framework wet chemical assembly.
منابع مشابه
Metal hierarchical patterning by direct nanoimprint lithography
Three-dimensional hierarchical patterning of metals is of paramount importance in diverse fields involving photonics, controlling surface wettability and wearable electronics. Conventionally, this type of structuring is tedious and usually involves layer-by-layer lithographic patterning. Here, we describe a simple process of direct nanoimprint lithography using palladium benzylthiolate, a versa...
متن کاملNanoimprint lithography
Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
متن کاملScalable, high performance, enzymatic cathodes based on nanoimprint lithography
Here we detail high performance, enzymatic electrodes for oxygen bio-electroreduction, which can be easily and reproducibly fabricated with industry-scale throughput. Planar and nanostructured electrodes were built on biocompatible, flexible polymer sheets, while nanoimprint lithography was used for electrode nanostructuring. To the best of our knowledge, this is one of the first reports concer...
متن کاملSiloxane Copolymers for Nanoimprint Lithography**
Nanoimprint lithography (NIL) is a fabrication technology that offers high-throughput, ultrahigh resolution patterning at great cost savings compared to most competing next-generation radiative lithography methods. As a result of its rapid development in the past decade and its potential for sub-100 nm lithography, NIL has been listed by MIT’s Technology Review as one of ten emerging technologi...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: ACS Applied Materials & Interfaces
سال: 2021
ISSN: ['1944-8244', '1944-8252']
DOI: https://doi.org/10.1021/acsami.1c05779